Canon's Nanoimprint Lithography System challenges ASML

Canon, renowned for its printers and cameras, unveiled “nanoimprint lithography” system, a cutting-edge solution, aimed at revolutionizing semiconductor component production.

Canon's Nanoimprint Lithography System challenges ASML

Canon, renowned for its printers and cameras, unveiled “nanoimprint lithography” system, a cutting-edge solution, aimed at revolutionizing semiconductor component production.

Reported by media, Canon’s newly revealed “nanoimprint lithography” system is poised to challenge the dominance of Dutch firm ASML in the extreme ultraviolet (EUV) lithography machine sector. ASML’s machinery plays a pivotal role in crafting advanced chips, including those featured in the latest Apple iPhones.

The use of such machines has become a focal point in the technological rivalry between the United States and China. The U.S. has employed export restrictions and diverse sanctions to impede China’s access to critical chips and manufacturing equipment, stalling the progress of the world’s second-largest economy in a sector where it is keen to catch up.

ASML’s EUV technology has gained widespread traction among leading chip manufacturers, primarily for its role in enabling the production of semiconductors at 5 nanometers and below. This nanometer measurement directly impacts the size of chip features, with smaller values accommodating more features on a chip, thereby enhancing semiconductor performance.

Canon’s announcement detailed that their new system, the FPA-1200NZ2C, is capable of producing semiconductors matching a 5nm process and can even scale down to an astounding 2nm. This surpasses the capabilities of the A17 Pro chip found in Apple’s iPhone 15 Pro and Pro Max, which is a 3nm semiconductor.

The Dutch government has imposed strict limitations on ASML, preventing the export of its EUV lithography machines to China, resulting in no units being shipped to the country. This restriction is due to the pivotal role of these machines in the production of cutting-edge semiconductor chips.

With Canon asserting that their new machine can facilitate the production of semiconductors equivalent to 2nm, it is poised to face heightened scrutiny.

It was previously reported that the Biden administration is actively targeting a loophole that has enabled developers in China to procure chips from the well-known Huaqiangbei electronics hub in Shenzhen, a city in southern China.

However, China has also introduced draft security regulations pertaining to companies offering generative artificial intelligence (AI) services, including restrictions on data sources utilized for AI model training. This indicates a dynamic landscape where technological advancements intersect with regulatory considerations.

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